Discover the reparative properties of Centella Asiatica with K-beauty brand Benton’s Goodbye Redness sheet mask. Rich in amino acids, beta carotene, fatty acids, and numerous potent phytochemicals, the powerful ingredient provides soothing relief to red, irritated and itchy skin. Soothing sensitive and acne-prone complexions, it helps accelerate skin’s natural healing process by boosting antioxidant activity at the site of inflammation, thus preventing scarring and future blemishes. helping to prevent scarring and prevent future breakouts.
Designed to perfectly adhere to your facial contours, the sheet mask is saturated with a high-performance essence, containing a 45% concentration of Centella Asiatica leaf water, alongside the plant’s extract and moisture-binding Hyaluronic acid. Deeply hydrating and soothing, the face mask leaves your skin looking clearer, brighter and calmer in 15-20 minutes.
Ideal for sensitive, redness-prone and inflamed skin. Fragrance-free.
Dermatologically-tested. Mildly acidic pH 6.
20-free formula without controversial ingredients, volatile alcohol, PEGs, silicones. Cruelty-free.
Use this sheet mask after cleansing and toning. Carefully unfold the mask and apply on to your face. Leave on for 15-20 minutes. Don't forget to pat in any remaining essence and bring down to the neck area. Discard mask after use.
Use sheet mask weekly or as needed for best results.
Centella Asiatica Leaf Water, Aqua (Water), Glycerin, Pentylene Glycol, Butylene Glycol, Microcrystalline Cellulose, Centella Asiatica Extract, Sodium Gluconate, Sodium Hyaluronate, Propanediol, Dipotassium Glycyrrhizate, Asiatic Acid, Madecassic Acid, Asiaticoside, Madecassoside, Portulaca Oleracea Extract, Xanthan Gum, Cellulose Gum, Caprylic/Capric Triglyceride, Hydrogenated phosphatidylcholine, 1,2-Hexanediol, Cetearyl Alcohol, Sucrose Stearate.
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